Excimer Laser Mirrors ArF (193nm) & KrF (248nm)
   Graph / Diagram

 

Specifications

 

Material:

VUV CaF2, UV Fused Silica

Parallelism:

< 3 arc min

Clear Aperture:

> 85% of central dimension

Chamfer:

0.3mm ´ 45°

Surface Figure:

l/10 at 632.8nm

Surface Quality:

20-10 for VUV CaF2

10-5 for UV Fused Silica

Power:

Up to 1J/cm2, ArF

Up to 4J/cm2, KrF

 

 

 

 

 

 

 

 

 

 

 

 

 

Part No

Diameter

Thickness

A.O.I.

ArF (193nm)

KrF (248nm)

RX-193-0-UF-1025

RX-248-0-UF-1025

1.00”

0.250”

0°

RX-193-0-UF-1420

RX-248-0-UF-1420

          36.0mm

5.0mm

0°

RX-193-0-UF-1520

RX-248-0-UF-1520

1.50”

5.0mm

0°

RX-193-0-UF-2038

RX-248-0-UF-2038

2.00”

0.375”

0°

RX-193-45-UF-1025

RX-248-45-UC-1025

1.00”

0.250”

  45°

RX-193-45-UF-1420

RX-248-45-UC-1420

          36.0mm

5.0mm

  45°

RX-193-45-UF-1520

RX-248-45-UC-1520

1.50”

5.0mm

  45°

RX-193-45-UF-2038

RX-248-45-UC-2038

2.00”

0.375”

  45°