Excimer Laser Mirrors XeCl (308nm) & XeF (351nm-353nm)
   Graph / Diagram

 

Specifications

 

Material:

 UV Fused Silica

Parallelism:

< 3 arc min

Clear Aperture:

> 85% of central dimension

Chamfer:

0.3mm ´ 45°

Surface Figure:

l/10 at 632.8nm

Surface Quality:

10-5 scratch-dig

Power:

Up to 4J/cm2

 

 

 

 

 

 

 

 

 

 

 

Part No

Diameter

Thickness

A.O.I.

XeCl (308nm)

XeF (351-353nm)

RX-308-0-UF-0525

RX-352-0-UF-0503

1.00”

0.250”

0°

RX-308-0-UF-1025

RX-352-0-UF-1025

          36.0mm

5.0mm

0°

RX-308-0-UF-1538

RX-352-0-UF-1538

1.50”

5.0mm

0°

RX-308-0-UF-2038

RX-352-0-UF-2038

2.00”

0.375”

0°

RX-308-45-UF-0525

RX-352-45-UF-0503

1.00”

0.250”

  45°

RX-308-45-UF-1025

RX-352-45-UF-1025

          36.0mm

5.0mm

  45°

RX-308-45-UF-1538

RX-352-45-UF-1538

1.50”

5.0mm

  45°

RX-308-45-UF-2038

RX-352-45-UF-2038

2.00”

0.375”

  45°

 

 

 

 

 

 

 

 

 

 

 

  • Convex or concave mirrors are also available upon request.
  • See Beamsplitter section for partially reflecting mirrors.
   Picture Image