Semiconductor Laser Mirrors For Telecommunication (1319nm, 1550nm)

Graph / Diagram

 

Specifications

 

Material:

UV Fused Silica

Parallelism:

< 1 arc sec

Clear Aperture:

> 85% of central dimension

Chamfer:

0.3mm ´ 45°

TWD:

l/10 at 632.8nm

Surface Quality:

10-5 scratch-dig

 
 
 
 
 
 
 
 
 
 
 

Part No

Wavelength

Diameter

Thickness

Min R* (%)

A.O.I.

RX-1319-0-UF-2004

1319nm

2.00”

1mm

99.5%

0°

RX-1319-0-UF-2008

1319nm

2.00”

2mm

99.5%

0°

RX-1545-0-UF-2004

1525-1565nm

2.00”

1mm

99.5%

0°

RX-1545-0-UF-2008

1525-1565nm

2.00”

2mm

99.5%

0°

RX-1590-0-UF-2004

1560-1620nm

2.00”

1mm

99.5%

0°

RX-1590-0-UF-2008

1560-1620nm

2.00”

2mm

99.5%

0°

 
 
 
 
 
 
 
 
 
 
 
 
 

*   Unpolarized beam

  • AR coated windows are also available. Call our application engineer.
  • Convex or concave mirrors are also available upon request.
  • See Beamsplitter section for partially reflecting mirrors.
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